スパッタリング法によるTiO_2およびTiN薄膜結晶成長

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タイトル別名
  • Crystalline Growth of Titanium Dioxide and Titanium Nitride Films by Sputtering Method
  • スパッタリングホウ ニ ヨル TiO2 オヨビ TiN ハクマク ケッショウ セイチョウ

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説明

A titanium dioxide (TiO_2) thin film, grown by the radio frequency (RF) sputtering method with gas pressure of 4×10^<-2> Torr, showed its polycrystalline structure of rutile phase by the X-ray diffraction method. Its electrical resistivity was estimated to be p=0.04 [Ωm]. A titanium nitride (TiN) thin film, grown by the same method with varied power, was measured its angles by the X-ray diffraction method, which demonstrated its structure should be polycrystalline.

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