Fabrication of Waveguide Laser Crystals by Laser Ablation Method. Toward the Fabrication of Laser Crystals on Si Substrates.

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  • ADACHI Kyoichi
    <I>Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University</I>
  • EZAKI Mizunori
    <I>Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University</I>
  • OBARA Minoru
    <I>Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University</I>
  • KUMAGAI Hiroshi
    <I>The Institute of Physical and Chemical Researc</I>
  • MIDORIKAWA Katsumi
    <I>The Institute of Physical and Chemical Researc</I>

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Other Title
  • レーザーアブレーション法による導波路型レーザー結晶の作製　　Ｓｉ基板上への作製を目指して
  • レーザー アブレーションホウ ニヨル ドウハロガタ レーザー ケッショウ ノ
  • toward the Fabrication of Laser Crystals on Si Substrates
  • Si基板上への作製を目指して

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OEIC (Optoelectronic integrated circuit) which interconnects various optical and electronic elements on thesame substrate, is a promising device in near future. The fabrication method ofoptical waveguides is desirableto be a vapor phase epitaxy and suitable for in situ processing. LPE (Liquid Phase Epitaxy) methods arewidely used to fabricate thin films, but recently much attention has been paid to PLD (Pulsed Laser Deposition) methods in the fabrication of optical thin films with various advantages such as adaptability to in-situ, processing, simple arrangement, stoichiometry of the films, epitaxial quality of complicated compoundmaterials as good as those by MBE (Molecular Beam Epitaxy) and MOCVD (Metal-Organic Chemical Vapor Deposition). In the present paper, it is experimentally shown that this PLD method is very effective andaffordable as fabrication techniques of these optical thin films.

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