Effect of Nb Concentration on Thermal Diffusivity of Nb-Doped TiO<sub>2</sub> Films

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  • NbドープTiO<sub>2</sub>薄膜の熱拡散率に対するNb添加効果
  • NbドープTiO2薄膜の熱拡散率に対するNb添加効果
  • Nb ドープ TiO2 ハクマク ノ ネツ カクサンリツ ニ タイスル Nb テンカ コウカ
  • Effect of Nb Concentration on Thermal Diffusivity of Nb-Doped TiO2 Films

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Abstract

TiO2 and Nb:TiO2 films with 300 nm-thickness were deposited on quartz glass substrates heated at 110°C by dc magnetron sputtering using reduced TiO2-x and Nb:TiO2-x targets with Nb concentrations of 3.7 and 9.5 at.%, and then post-annealed under vacuum at 600°C. In order to measure the thermal diffusivity, Mo/(TiO2 or Nb:TiO2)/Mo three-layered films, were prepared on quartz glass substrates. Thermal diffusivity was measured by ‘rear heating/front detection type’ nanosecond thermoreflectance system. As Nb concentration of the films increases, thermal diffusivity of the film decreased from 2.1×10-6 to 1.2×10-6 m2s-1. Mechanism of this decrease is attributed to enhancement of scattering of phonon induced by Nb atoms which is heavier than Ti.

Journal

  • Netsu Bussei

    Netsu Bussei 25 (3), 117-120, 2014

    JAPAN SOCIETY OF THERMOPHYSICAL PROPERTIES

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