Study of Nano-Stereolithography Using Evanescent Light (2nd report)
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- KAJIHARA Yusuke
- 東京大学大学院
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- INAZUKI Yuichi
- 東京大学大学院(現,大日本印刷(株)電子デバイス研究所)
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- TAKAHASHI Satoru
- 東京大学大学院
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- TAKAMASU Kiyoshi
- 東京大学大学院
Bibliographic Information
- Other Title
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- エバネッセント光を利用したナノ光造形法に関する研究(第2報)
- エバネッセントコウ オ リヨウシタ ナノ ヒカリ ゾウケイホウ ニ カンスル ケンキュウ ダイ 2ホウ テイザイ エバネッセントコウ オ リヨウシタ ビサイ シュウキ コウゾウ ソウセイ
- -Photofabrication of Fine Lattice Structures Using Standing Evanescent Light-
- —定在エバネッセント光を利用した微細周期構造創製—
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Abstract
Micro-fabrication technologies have recently developed dramatically and fabrication methods have become much-needed with which devices on the order of micrometer can be fabricated precisely. In particular, methods of fabricating MEMS and microscopic optical devices as typified by a photonic crystal are in huge demand. In this study, we propose a novel stereolithography method using evanescent light instead of propagating light to realize a 100-nanometer resolution. With this method, we intend to establish the nano-stereolithography with higher accuracy and flexibility. In the second report, we performed the fabrication of in-plane lattice structures, which is strongly required as diffraction grating, diffractive optics, photonic crystals, etc. Theoretical and experimental analyses suggest that the proposed stereolithography method using evanescent light has a potential to fabricate micro three-dimensional objects with a resolution of sub-micrometer.
Journal
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- Journal of the Japan Society for Precision Engineering
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Journal of the Japan Society for Precision Engineering 73 (8), 934-939, 2007
The Japan Society for Precision Engineering
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Keywords
Details 詳細情報について
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- CRID
- 1390282679772775296
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- NII Article ID
- 110006368886
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- NII Book ID
- AN1003250X
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- ISSN
- 1882675X
- 09120289
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- NDL BIB ID
- 8922069
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed