書誌事項
- タイトル別名
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- Study of Nano-Stereolithography Using Evanescent Light (2nd report)
- エバネッセントコウ オ リヨウシタ ナノ ヒカリ ゾウケイホウ ニ カンスル ケンキュウ ダイ 2ホウ テイザイ エバネッセントコウ オ リヨウシタ ビサイ シュウキ コウゾウ ソウセイ
- -Photofabrication of Fine Lattice Structures Using Standing Evanescent Light-
- —定在エバネッセント光を利用した微細周期構造創製—
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Micro-fabrication technologies have recently developed dramatically and fabrication methods have become much-needed with which devices on the order of micrometer can be fabricated precisely. In particular, methods of fabricating MEMS and microscopic optical devices as typified by a photonic crystal are in huge demand. In this study, we propose a novel stereolithography method using evanescent light instead of propagating light to realize a 100-nanometer resolution. With this method, we intend to establish the nano-stereolithography with higher accuracy and flexibility. In the second report, we performed the fabrication of in-plane lattice structures, which is strongly required as diffraction grating, diffractive optics, photonic crystals, etc. Theoretical and experimental analyses suggest that the proposed stereolithography method using evanescent light has a potential to fabricate micro three-dimensional objects with a resolution of sub-micrometer.
収録刊行物
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- 精密工学会誌
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精密工学会誌 73 (8), 934-939, 2007
公益社団法人 精密工学会
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詳細情報 詳細情報について
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- CRID
- 1390282679772775296
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- NII論文ID
- 110006368886
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- NII書誌ID
- AN1003250X
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- ISSN
- 1882675X
- 09120289
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- NDL書誌ID
- 8922069
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- NDL
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