Mechano-chemical polishing of ferrite. (1st report). The effects of polishing fluid and material of polishing plates.
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- OCHIAI Yuuji
- (株)日立製作所
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- ARAKAWA Noriyoshi
- (株)日立製作所
Bibliographic Information
- Other Title
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- フェライト材のメカノケミカルポリシング I 加工液,定盤材質及び加工機構について
- フェライトザイ ノ メカノケミカルポリシング 1 カコウエキ ジョウバン ザイ
- The Effects of Polishing Fluid and Material of Polishing Plates
- 加工液,定盤材質及び加工機構について
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Abstract
This paper presents some experimental results on mechano-chemical polishing of ferrite, and suggestion on the mechanism of mechano-chemical polishing. Such elastic polishing plates as synthetic leather is popularly used with an alkaline polishing fluid in the mechano-chemical polishing of semiconductive materials. In this paper, however, polishing plates made by either tin or lead are used with chemically active polishing fluid to ferrite. Electro-chemical action is added to mechanical polishing for the sake of composing the local cell between a polishing plate and a workpiece. Electro-chemical action not only increases stock removal rate twice or more, but also reduces the surface damaged layer of workpieces a quarter or less in comparison with those in mechanical polishing process.
Journal
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- Journal of the Japan Society for Precision Engineering
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Journal of the Japan Society for Precision Engineering 54 (3), 574-579, 1988
The Japan Society for Precision Engineering
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Keywords
Details 詳細情報について
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- CRID
- 1390282679773040000
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- NII Article ID
- 110001369523
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- NII Book ID
- AN1003250X
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- ISSN
- 1882675X
- 09120289
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- NDL BIB ID
- 3166597
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed