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Effect of Washing and Subsequent Heat Treatment on the Water Repellency of Poly(ethylene terephthalate) Fabric and Film Treated with Carbon Tetrafluoride and Trifluoromethane Low-Temperature Plasmas.
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- Wakida Tomiji
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- Goto Tokuju
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- Li Huishun
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- Sato Tetsuya
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- Lee Muncheul
- Department of Clothing and Textiles, Kyungsung University
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- Chen Jierong
- Department of Textile Chemistry, North-West Institute of Textile Science and Technology
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Description
Poly (ethylene terephthalate) fabric and film were treated with carbon tetrafluoride and trifluoromethane low-temperature plasmas, washed and subsequently heat-treated. The excellent water repellency of the plasmatreated fabrics was decreased by washing and recovered again by heat treatment. The critical surface tension of the plasma-treated films was increased by washing and decreased by the subsequent heat treatment in accordance with the water repellency of the CF4 and CHF3 plasma-treated fabrics. Changes in the surface chemical components were investigated by means of ESCA analysis. The F1s intensity of the plasma-treated fabrics was decreased by washing and recovered by heat treatment, while the O1s intensity was increased by washing and decreased by heat treatment. An excellent correlation was obtained between the change in water repellency of the fabrics by washing and heat treatment and the results of ESCA analysis.
Journal
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- Sen'i Gakkaishi
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Sen'i Gakkaishi 50 (11), 533-537, 1994
The Society of Fiber Science and Technology, Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679806434944
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- NII Article ID
- 130004205498
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- COI
- 1:CAS:528:DyaK2MXjtVCnu74%3D
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- ISSN
- 18842259
- 00379875
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- Text Lang
- en
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed