Influence of Epoxy Group Reactivity on Transparency of Thermocurable Positive-type Photoresist
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- TAKAHASHI Shuichi
- AZ Electronic Materials (Japan) K.K.
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- HAYASHIDA Mika
- Department of Applied Chemistry & Biochemistry, Faculty of Engineering, Kumamoto University
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- OGATA Tomonari
- Graduate School of Science and Technology, Kumamoto University
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- NONAKA Takamasa
- Graduate School of Science and Technology, Kumamoto University
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- KURIHARA Seiji
- Graduate School of Science and Technology, Kumamoto University
Bibliographic Information
- Other Title
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- エポキシ化合物により熱硬化性を付与したポジ型フォトレジストの透明性への熱硬化反応の影響
- エポキシ カゴウブツ ニ ヨリ ネツ コウカセイ オ フヨシタ ポジガタ フォトレジスト ノ トウメイセイ エノ ネツ コウカ ハンノウ ノ エイキョウ
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Description
A novel over coating layer (OCL) was prepared by blending acrylic copolymer and epoxy compound. The OCL material showed a long shelf life at room temperature, but it clouded during post-baking process. The mechanism of the clouding was investigated by NIR, SEM, and AFM. NIR was the especially useful method to follow the reaction between acrylic copolymer and epoxy compound. Through these measurements, it was confirmed that the final reaction extent of the OCL containing palmitic acid was higher than that of the OCL without the acid. The carboxylic acids with a long alkyl group such as palmitic acid reduced the phase separation between the acrylic copolymer and epoxy compound at post-baking process, and resulted in a long shelf life and clear surface condition of the OCL.
Journal
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- Journal of Network Polymer,Japan
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Journal of Network Polymer,Japan 28 (4), 230-238, 2007
Japan Thermosetting Plastics Industry Association
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Details 詳細情報について
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- CRID
- 1390282680065297152
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- NII Article ID
- 130003390020
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- NII Book ID
- AN10521608
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- ISSN
- 13420577
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- COI
- 1:CAS:528:DC%2BD1cXhsVSlt7s%3D
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- NDL BIB ID
- 9334420
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed