Magnetic circuit disign for new vertical sputtering source

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Other Title
  • 高効率縦型スパッタソースの磁路設計

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Description

  A magnetic circuit design by using a computer simulation has been performed, aiming at optimization of parameters for enhancing the magnetic field in the area of plasma formation. By the simulation, it becomes clear as follows: (a) The bottom thickness of the target is one of the most sensitive parameters. (b) The distance between the target bottom and the magnet placed beneath the target is also a sensitive parameter. (c) The effect of a return path formed with soft magnet irons around the target cannot be ignored. (d) The target permeability governs the field so strongly that a particular attention must be paid for high permeability materials to design an efficient magnetic circuits.

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Details 詳細情報について

  • CRID
    1390282680068154368
  • NII Article ID
    130004477968
  • DOI
    10.3379/jmsjmag.17.s2_176
  • ISSN
    18804004
    02850192
  • Data Source
    • JaLC
    • Crossref
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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