Si(OC<sub>2</sub>H<sub>5</sub>)<sub>4</sub>から作成した石英ガラス類似非晶体について

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タイトル別名
  • Non-crystalline Material Similar to Fused Silica from Si(OC<sub>2</sub>H<sub>5</sub>)<sub>4</sub>
  • Si OC2H5 4 カラ サクセイシタ セキエイ ガラス ルイジ ヒショウタ

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Monolithic non-crystalline silica was produced by heating the gelled mass of Si (OC2H5)4 hydrolyzed with H2O. The Structure and properties of obtained material were compared with those of fused silica. A broad absorption band ranging from 3700 to 2700cm-1 was observed in the infrared spectrum of the sample heated at a temperature below 500°C. This broad band was resolved into four absorption bands with peaks at 3650, 3600, 3400 and 3200cm-1, respectively, which were all related to Si-OH bonds. The intensity of these absorption bands decreased with the heating temperature. The bands with peaks at 3400 and 3200cm-1 which were ascribed to surface hydroxyl groups were especially sensitive to the temperature and disappeared in the range 600°-800°C. The gelled mass abruptly decreased its surface area at the temperature corresponding to disappearance of absorption bands at 3400 and 3200cm-1 and transferred to the pore free material. Vickers hardness also increased abruptly at the similar temperature approaching nearly the same value as that of fused silica with heating temperature.<br>In the obtained material by the heat treatment above 600°-800°C, the intensity of small angle X-ray scattering was not pronounced and the positions of absorption bands due to OH bonds agreed with those of fused silica. Density and refractive index were comparable with those of fused silica, though water content was a little more than in fused silica.

収録刊行物

  • 窯業協會誌

    窯業協會誌 87 (1001), 43-48, 1979

    公益社団法人 日本セラミックス協会

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