Preparation of Ni-Zn Ferrite Thin Films by ICP Flash Evaporation Method

DOI Web Site Web Site 2 Citations
  • SAKURAI Osamu
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
  • KUMAGAI Kazumasa
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
  • KIEDA Nobuo
    Department of Material Science and Ceramics, Shonan Institute of Technology
  • OGURA Atsushi
    Ogura Laboratory
  • SHINOZAKI Kazuo
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
  • MIZUTANI Nobuyasu
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology

Bibliographic Information

Other Title
  • ICPフラッシュ蒸着法によるNi-Znフェライト薄膜の合成
  • ICP フラッシュ ジョウチャクホウ ニ ヨル Ni Zn フェライト ハクマ

Search this article

Abstract

Ni-Zn ferrite thin films were prepared on fused silica plates by an inductively coupled plasma (ICP) flash evaporation method using ultrasonically atomized aqueous solutions of corresponding metal ions in the reduced Ar gas of 30kPa. All the films consisted same-size columnar particles and the particle size increased from 0.1 to 0.5μm in diameter with deposition time. The growth rate of the films was about 2.9μm/h. In this method, the metal composition agreed with that of the starting solution. Therefore, the ICP flash evaporation method using the mists of aqueous solutions was more advantageous to control the composition of complex metal oxide films than the method using the mixed oxide powders.

Journal

Citations (2)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top