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- 安井 平司
- 熊本大学工学部
書誌事項
- タイトル別名
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- Ultra-Smoothness Polishing of Glass Magnetic Disk Substrate (1st Report)
- ガラス磁気ディスク基板の超平滑ポリシング(第1報)除去速度と平滑度に及ぼすポリシング圧力の影響
- ガラス ジキ ディスク キバン ノ チョウヘイカツ ポリシング ダイ1ポウ ジョキョ ソクド ト ヘイカツド ニ オヨボス ポリシング アツリョク ノ エイキョウ
- —Influence of Polishing Pressure on Removal Rate and Smoothness—
- —除去速度と平滑度に及ぼすポリシング圧力の影響—
この論文をさがす
説明
The research deals with the ultra-smoothness polishing technique of a glass type of magnetic disk substrate. The influence of polishing pressure on the removal rate and smoothness in polishing of a glass type of substrate with cerium oxide abrasives is experimentally examined and discussed. The substrate surface roughness is measured with a contact type of ordinary profilometer, interferometric surface profiler and AFM. The substrate smoothness is evaluated from the standpoint of the slight undulation Hw(Rz) and the surface roughness Hr(Rz), which are obtained by measuring 4mm and 250μm in the length of substrate surface, respectively. The substrate removal depth increases linearly with polishing time. The substrate removal rate becomes larger for higher polishing pressure. Over a critical polishing pressure, the removal rate is expressed by a simple equation related to polishing pressure. The slight undulation and surface roughness converge finally to a terminal value corresponding to a given polishing pressure, respectively. The terminal slight undulation increases somewhat with polishing pressure. The terminal surface roughness, on the other hand, is influenced little by polishing pressure.
収録刊行物
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- 精密工学会誌論文集
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精密工学会誌論文集 70 (9), 1206-1210, 2004
公益社団法人 精密工学会
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詳細情報 詳細情報について
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- CRID
- 1390282680258626048
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- NII論文ID
- 110001824053
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- NII書誌ID
- AA11966630
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- ISSN
- 18818722
- 13488716
- 13488724
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- NDL書誌ID
- 7071534
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
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- 抄録ライセンスフラグ
- 使用不可