High quality large-area graphene synthesis with high growth rate using plasma-enhanced CVD

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  • HASEGAWA Masataka
    Nanomaterials Research Institute, AIST Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division
  • TSUGAWA Kazuo
    Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division
  • KATO Ryuichi
    Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division
  • KOGA Yoshinori
    Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division
  • ISHIHARA Masatou
    Nanomaterials Research Institute, AIST Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division
  • YAMADA Takatoshi
    Nanomaterials Research Institute, AIST Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division
  • OKIGAWA Yuki
    Nanomaterials Research Institute, AIST Technology Research Association for Single Wall Carbon Nanotubes, Graphene Division

Bibliographic Information

Other Title
  • プラズマを用いたグラフェンの高品質高速大面積CVD 合成
  • プラズマを用いたグラフェンの高品質高速大面積CVD合成 : 高スループットプロセスを目指して
  • プラズマ オ モチイタ グラフェン ノ コウヒンシツ コウソク ダイ メンセキ CVD ゴウセイ : コウスループットプロセス オ メザシテ
  • — 高スループットプロセスを目指して —
  • — Toward a high throughput process —

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Description

The current trend in graphene synthesis is to use thermal chemical vapor deposition (CVD) at temperatures of 1000 °C or higher. For industrial use of graphene as transparent conductive films, higher throughput of graphene synthesis is necessary. We were among the first to adopt the plasma-enhanced CVD method, and have developed a process of high-speed large-area deposition for transparent conductive film applications. The development and a method to remove impurities from the process are presented in this paper. We report improvement in graphene film quality and other properties by decreasing the nucleus density using plasma-enhanced CVD.

Journal

  • Synthesiology

    Synthesiology 9 (3), 124-138, 2016

    National Institute of Advanced Industrial Science and Technology

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