Focusing of Ion Beams by Using a Capillary

DOI Web Site 4 References
  • WATANABE Kouji
    National Institute of Advanced Industrial Science and Technology (AIST)
  • KONDOU Kouji
    National Institute of Advanced Industrial Science and Technology (AIST)
  • FUJIWARA Yukio
    National Institute of Advanced Industrial Science and Technology (AIST)
  • SAITO Naoaki
    National Institute of Advanced Industrial Science and Technology (AIST)
  • NONAKA Hidehiko
    National Institute of Advanced Industrial Science and Technology (AIST)
  • ICHIMURA Shingo
    National Institute of Advanced Industrial Science and Technology (AIST)

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Other Title
  • キャピラリーによるイオンビームの収束
  • キャピラリー ニ ヨル イオンビーム ノ シュウソク

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Abstract

  A ruby capillary which is available as an industrial product for the wire bonding machines for the microelectronics has been adopted to focus ion beams passively for the first time. An Ar+ ion beam with a beam current density of 3×10-6 A•cm-2 at an energy of 4 keV has been found to penetrate steadily the ruby capillary and the behavior of the beam through the capillary has been investigated in details. It has been also found that a large amount of secondary electrons are generated when the ion beam hits the capillary and a negative bias should be applied to the Faraday cup to measure the ion beam current through the capillary though the positive ion beam is to be measured.<br>

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