Evaluation of Gold Film Deposited using Neutral Argon Beam

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  • 中性アルゴンビームを用いて作製した金薄膜の評価
  • チュウセイ アルゴンビーム オ モチイテ サクセイ シタ キン ハクマク ノ ヒョウカ

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Abstract

  Gold film of a thickness of about 100 nm with extremely high resistivity was obtained through sputtering by neutral argon beam. The resistivity differed according to the angle of incidence for argon beam, indicating the lowest value in the vicinity of 60 degree. In the case of sputtering for the angle of incidence of 60 degree, the work function for gold film indicated the lowest value and the secondary electron emission current from gold target during the sputtering increased markedly. These results have suggested that the ionized gold particles play an important role at growth process, leading to enhanced the decrease of amorphous structure into the gold film.<br>

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