書誌事項
- タイトル別名
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- X-ray measurement of residual stresses in sintered silicon nitride.
- ジョウアツ ショウケツ チッカ ケイソ ノ Xセン ザンリュウ オウリョク ソ
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The X-ray elastic constants of sintered silicon nitride were measured for the diffraction plane (323) by using Cu-Kα radiation and for (411) by using Cr-Kα radiation. The values of E/(1+ν) (E=Young's modulus, ν=Poisson's ratio) were nearly identical for both planes, and were larger than the mechanically measured value. The residual stress on the lapped and ground surfaces was measured both with (323) and (411) diffractions. The measured values were all compression. The compressive stress for (411) plane was three to four times larger than that for (323) plane, which indicated a steep decrease of compression in the subsurface layer. The compressive residual stress in the direction perpendicular to the grinding direction was about twice the value in the grinding direction.
収録刊行物
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- 材料
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材料 36 (407), 817-822, 1987
公益社団法人 日本材料学会
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詳細情報 詳細情報について
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- CRID
- 1390282680370411776
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- NII論文ID
- 110002301303
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- NII書誌ID
- AN00096175
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- ISSN
- 18807488
- 05145163
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- NDL書誌ID
- 3138715
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可