書誌事項
- タイトル別名
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- Fabrication of (Ba,La)SnO<sub>3</sub> Films on (111)SrTiO<sub>3</sub> Substrate
- (111)SrTiO₃基板上への(Ba,La)SnO₃薄膜の結晶成長
- (111)SrTiO ₃ キバン ジョウ エ ノ(Ba,La)SnO ₃ ハクマク ノ ケッショウ セイチョウ
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説明
<p>Recently, BaSnO3 is attracting great attention as one of the promising oxide semiconductors with large bandgap (3.1 eV) and high mobility. The lattice constant and the band gap of this material can be tuned by changing the A site ion to Sr and Ca that should be an advantage if it is stacked to other oxide films with perovskite structure. In this paper, the growth and the characterization of (Ba,La)SnO3 thin films on (111) SrTiO3 substrate by pulsed laser deposition method are described. The effect of the O2 gas pressure on the stoichiometry, crystallinity and the deposition rate of film are investigated. Eventually (111) (Ba,La)SnO3 epitaxial film with the electron concentration of 2.2×1019 cm-3 and the hall mobility of 22.5 cm2V-1s-1 was successfully obtained.</p>
収録刊行物
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- 材料
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材料 65 (9), 638-641, 2016
公益社団法人 日本材料学会
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詳細情報 詳細情報について
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- CRID
- 1390282680421011456
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- NII論文ID
- 130005416089
- 40020960265
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- NII書誌ID
- AN00096175
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- ISSN
- 18807488
- 05145163
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- NDL書誌ID
- 027655772
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可