Formation of Polymethylsiloxane Network between Layers of Mica by Chemical Vapor Deposition of Tetramethylcyclotetrasiloxane

DOI Web Site 8 References

Bibliographic Information

Other Title
  • CVD法を用いたテトラメチルシクロテトラシロキサンによる雲母層間での網目状ポリメチルシロキサンの形成
  • CVDホウ オ モチイタ テトラメチルシクロテトラシロキサン ニ ヨル ウンモソウ カン デ ノ アミメジョウ ポリメチルシロキサン ノ ケイセイ

Search this article

Description

Tetramethylcyclotetrasiloxane (H-4) was deposited on mica by chemical vapor deposition. As a result, weight and volume of mica increased with increasing reaction time. The results of infrared spectroscopy of H-4 treated mica showed that H-4 was polymerized by catalytic activity of mica and polymethylsiloxane (PMS) network was formed on the surface and between the layers of mica. Moreover, X-ray diffraction of H-4 treated mica indicated that the PMS films were formed between layers of mica and mica was considered to be cleaved by the PMS films.

Journal

References(8)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top