Study of DLC Coating to the Trench-Shaped Pattern by Bipolar PBII

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  • HIRATA Yuki
    The University of Tokyo
  • PARK Wonsoon
    The University of Tokyo
  • CHOI Junho
    Department of Mechanical Engineering, Graduate School of Engineering, The University of Tokyo
  • KATO Takahisa
    Department of Mechanical Engineering, Graduate School of Engineering, The University of Tokyo

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Other Title
  • バイポーラPBII法によるトレンチ形状物へのDLC成膜
  • バイポーラ PBIIホウ ニ ヨル トレンチ ケイジョウブツ エ ノ DLCセイマク

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<p>Bipolar-type plasma based ion implantation and deposition (bipolar PBII&D) is a promising surface coating technique for the complex-shaped target surface. In this study, DLC films were prepared by bipolar PBII&D technique to a trench-shaped pattern, and uniformity, structure and mechanical properties of the DLC films on the top, inside wall and bottom surfaces of the trench were evaluated by surface roughness measurements, Raman spectroscopy and nanoindentation hardness tests. As a result, thickness uniformity of the DLC films improves with decreasing negative pulse voltage. On the other hand, the thickness of DLC films on the inside wall of the trench is much smaller than those of the top and bottom surfaces of the trench. The reason for this may be because the conformal ion sheath is not formed in surrounding of the inside wall. For the DLC films on the inside wall, Raman G-peak position shifts to a higher wave number and Full width at half maximum of G-peak 〔FWHM(G)〕decreases to a smaller value compared to those of the films on the top and bottom surfaces. These indicate that the DLC films on the inside wall surface are graphitized, which results in reduction of hardness.</p>

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