Development of novel oxide multilayer mirrors at "water-window" wavelengths by atomic layer deposition / atomic layer epitaxy

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Abstract

The authors proposed that novel oxide superlattice structures of crystalline TiO2/ZnO on sapphire substrates could be fabricated for high-reflection multilayer mirrors at 2.734 nm. In the experimental study, both rutile TiO2 (200) and wurtzite ZnO (0001) thin films were grown epitaxially on the same sapphire (0001) substrates by atomic layer epitaxy (ALE) at 450℃. the authors also demonstrated for the first time that the novel oxide superlattice structure of 10-bilayer TiO2/ZnO on a sapphire substrate gave high reflectance at 2.734 nm.

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