Design and development of UV-NIL materials for optical devices

DOI

Bibliographic Information

Other Title
  • 光学素子への応用を目的としたUV-NIL用材料の設計・合成

Abstract

We attempt to oconstruction of new UV-NIL materials for optical devices. We designed and compounded a novel UV-NIL photoresist with tricycloalkane or adamantane derivatives having acrylate or methacrylate units as a main component and 1-hydroxycyclohexylphenylketone as a typical photoinitiator. We will report the details of photopolymerization of these resist.

Journal

Keywords

Details 詳細情報について

  • CRID
    1390282680530859904
  • NII Article ID
    130004645790
  • DOI
    10.11494/kisoyuki.2011.0.280.0
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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