書誌事項
- タイトル別名
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- 20916 Study on particle behavior analysis method in low vacuum region
抄録
The particle of the film deposition sub-product etc. is one of the factors which leads to the quality decrease in the film deposition device under a low vacuum. The particle behavior analysis is important for the factor analysis. However, the analysis in a low vacuum was difficult although the particle behavior analysis under the atmospheric pressure was possible. In this study, the fluid resistance that is applied on the particle in a low vacuum was revised by the function of pressure, and implication method to general fluid analysis software was examined. The capability to reproduce the falling movement of a particle due to gravity was confirmed by an experiment.
収録刊行物
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- 日本機械学会関東支部総会講演会講演論文集
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日本機械学会関東支部総会講演会講演論文集 2009.15 (0), 409-410, 2009
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390282680823857536
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- NII論文ID
- 110007722404
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- ISSN
- 24242691
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可