413 Crack-tip Field Analyses of Silicon by Tersoff Potential, Tight-binding method and Ab-initio calculation
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- KUGIMIYA Tetsuya
- Osaka University
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- SHIBUTANI Yoji
- Osaka University
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- Gumbsch Peter
- Max-Planck-Institut fur Metallforschung
Bibliographic Information
- Other Title
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- 413 Tersoffポテンシャル,TB法,第一原理計算によるシリコンき裂先端場の解析(GS-1 分子動力学法)
Description
Crack-tip field of silicon is analyzed using the molecular dynamics simulation with the empirical Tersoff potential and Tight-binding (TB) method with environment-dependent TB potential. As a result of using the Tersoff potential, the crack-tip tends to round due to its cut-off function. TB calculations show that the anisotropic bond breaking process at the crack-tip is obtained, which is in good agreement with the ab-initio results. It is found that the surface reconstruction on the crack wake plays an important role on this anisotropy.
Journal
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- The Proceedings of Conference of Kansai Branch
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The Proceedings of Conference of Kansai Branch 2001.76 (0), _4-27_-_4-28_, 2001
The Japan Society of Mechanical Engineers
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Keywords
Details 詳細情報について
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- CRID
- 1390282680826594816
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- NII Article ID
- 110002492027
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- ISSN
- 24242756
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed