Chemical Mechanical Polishing of SiC Substrate using Enhanced Slurry of Nano-Bubbles with Active Gas by Plasma
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- MIZUUCHI Shinya
- Graduate school of Kanazawa Institute of Technology
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- MAMENO Tensei
- Kanazawa Institute of Technology
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- UNEDA Michio
- Kanazawa Institute of Technology
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- SHIBUYA Kazutaka
- Fujikoshi Machinery Corp.
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- ISHIKAWA Ken-ichi
- Kanazawa Institute of Technology
Bibliographic Information
- Other Title
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- プラズマにより活性化したガスを内包したナノバブル添加スラリーによるSiC基板のCMP手法に関する基礎検討
Journal
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- The Proceedings of Conference of Hokuriku-Shinetsu Branch
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The Proceedings of Conference of Hokuriku-Shinetsu Branch 2017.54 (0), G013-, 2017
The Japan Society of Mechanical Engineers
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Details 詳細情報について
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- CRID
- 1390282680842500608
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- NII Article ID
- 130007110318
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- ISSN
- 24242772
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles