Application of Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge to Efficient Generation of Active Oxygen Species.
Bibliographic Information
- Other Title
-
- 方形波パルス無声放電を用いた非平衡プラズマ化学反応の活性酸素種高効率生成への応用
- ホウケイハ パルス ムセイ ホウデン オ モチイタ ヒ ヘイコウ プラズマ カ
Search this article
Abstract
Oxygen atoms play a very importtant role in the atomospheric chemical vapor deposition of silicon dioxide films using tetraethylorthosilicate (TEOS) and ozone. In this study, the efficient generation of active oxygen species included these oxygen atoms has been carried out by use of pulsed silent discharge utilizing fast rising voltage. Discharge and generation characteristics of ozone. which is one of active oxygen species, have been measured experimentally. Generation characteristics of other active oxygen species have been estimated by chemical reaction simulation. As a result, it has been clarified that pulsed silent discharge can achieve highly nonequilibrium plasma conditions and generate active oxygen species efficiently.
Journal
-
- TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series B
-
TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series B 63 (609), 1720-1727, 1997
The Japan Society of Mechanical Engineers
- Tweet
Keywords
Details 詳細情報について
-
- CRID
- 1390282680870998912
-
- NII Article ID
- 130004079963
- 110002396379
-
- NII Book ID
- AN00187441
-
- ISSN
- 18848346
- 03875016
-
- NDL BIB ID
- 4215531
-
- Text Lang
- ja
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed