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02aB06 Metalorganic Chemical Vapor Deposition of Zinc Oxide Films by Using ZnMOPD as a Source Material(NCCG-36)
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- Kasuga Masanobu
- Interdisciplinary School of Medicine and Engineering, University of Yamanashi
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- Minegishi Kazunori
- Interdisciplinary School of Medicine and Engineering, University of Yamanashi
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- Akiyama Shutetsu
- Interdisciplinary School of Medicine and Engineering, University of Yamanashi
Bibliographic Information
- Other Title
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- 02aB06 ZnMOPDを原料とするZnOのMOCVD(半導体エピ(4),第36回結晶成長国内会議)
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Description
A new precursor, ZnMOPD, and water vapor were used to form zinc oxide films by MOCVD. On (0001) sapphire substrate ZnO films with (0001) orientation were grown at 500℃.
Journal
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- Journal of the Japanese Association for Crystal Growth
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Journal of the Japanese Association for Crystal Growth 33 (4), 276-, 2006
The Japanese Association for Crystal Growth
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Details 詳細情報について
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- CRID
- 1390282680873265664
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- NII Article ID
- 110006208539
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- NII Book ID
- AN00188386
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- ISSN
- 21878366
- 03856275
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- Text Lang
- ja
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- Data Source
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- JaLC
- CiNii Articles
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- Abstract License Flag
- Disallowed