02aB06 Metalorganic Chemical Vapor Deposition of Zinc Oxide Films by Using ZnMOPD as a Source Material(NCCG-36)

  • Kasuga Masanobu
    Interdisciplinary School of Medicine and Engineering, University of Yamanashi
  • Minegishi Kazunori
    Interdisciplinary School of Medicine and Engineering, University of Yamanashi
  • Akiyama Shutetsu
    Interdisciplinary School of Medicine and Engineering, University of Yamanashi

Bibliographic Information

Other Title
  • 02aB06 ZnMOPDを原料とするZnOのMOCVD(半導体エピ(4),第36回結晶成長国内会議)

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Description

A new precursor, ZnMOPD, and water vapor were used to form zinc oxide films by MOCVD. On (0001) sapphire substrate ZnO films with (0001) orientation were grown at 500℃.

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Details 詳細情報について

  • CRID
    1390282680873265664
  • NII Article ID
    110006208539
  • NII Book ID
    AN00188386
  • DOI
    10.19009/jjacg.33.4_276
  • ISSN
    21878366
    03856275
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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