Grazing Incidence X-Ray Diffraction Study on Effect of Implanted BF<sup>+</sup> <sub>2</sub> and Linewidth on Titanium Silicidation
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- Tomita Hirofumi
- Fujitsu Laboratories Limited, 10–1 Morinosato–Wakamiya, Atsugi, Kanagawa 243–01, Japan
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- Komiya Satoshi
- Fujitsu Laboratories Limited, 10–1 Morinosato–Wakamiya, Atsugi, Kanagawa 243–01, Japan
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- Horii Yoshimasa
- Fujitsu Laboratories Limited, 10–1 Morinosato–Wakamiya, Atsugi, Kanagawa 243–01, Japan
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- Nakamura Tomoji
- Fujitsu Laboratories Limited, 10–1 Morinosato–Wakamiya, Atsugi, Kanagawa 243–01, Japan
書誌事項
- タイトル別名
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- Grazing Incidence X-Ray Diffraction Study on Effect of Implanted BF+2 and Linewidth on Titanium Silicidation.
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説明
The C49 and C54 fractions in TiSi2 are examined quantitatively by the grazing incidence X-ray diffraction method in order to study the effect of BF+2 implanted in Si substrates and linewidth on TiSi2 silicidation and the phase transition from C49 to C54. BF+2 implantation suppresses both silicidation and the phase transition, and the phase transition is also markedly suppressed on narrow lines. As a result, all the C49 TiSi2 remains for 0.5 µ m lines with BF+2 dose of 2× 1015 cm-2 after the 2nd rapid thermal annealing (800° C, 30 s). Furthermore, we have found that the grains of C49 TiSi2 are preferentially oriented to highly implanted substrates. This indicates that the phase of these grains is stable thermally and difficult to transform to C54 phase.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 34 (7B), L876-L878, 1995
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681221810944
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- NII論文ID
- 110003922917
- 130004521727
- 210000038818
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- NII書誌ID
- AA10650595
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- COI
- 1:CAS:528:DyaK2MXnt1yrtbc%3D
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可