Stimulated Emission by Current Injection from an AlGaN/GaN/GaInN Quantum Well Device.

  • Akasaki Isamu
    Department of Electrical and Electronic Engineering, Meijo University, 1–501 Shiogamaguchi, Tempaku–ku, Nagoya 468, Japan
  • Amano Hiroshi
    Department of Electrical and Electronic Engineering, Meijo University, 1–501 Shiogamaguchi, Tempaku–ku, Nagoya 468, Japan
  • Sota Shigetoshi
    Department of Electrical and Electronic Engineering, Meijo University, 1–501 Shiogamaguchi, Tempaku–ku, Nagoya 468, Japan
  • Sakai Hiromitsu
    Department of Electrical and Electronic Engineering, Meijo University, 1–501 Shiogamaguchi, Tempaku–ku, Nagoya 468, Japan
  • Tanaka Toshiyuki
    Pioneer Electronic Corporation, 1–1 Fujimi 6–chome, Tsurugashima–shi, Saitama 350–02, Japan
  • Koike Masayoshi
    Toyoda Gosei Co., Ltd., 1 Nagahata, Ochiai, Haruhi–cho, Nishikasugai–gun, Aichi 452, Japan

Search this article

Description

Quantum well structures composed of GaInN well and GaN barrier were fabricated. Room-temperature stimulated emission by pulsed current injection is observed from group III nitride using the very thin active layer, for the first time.

Journal

Citations (26)*help

See more

References(14)*help

See more

Details 詳細情報について

  • CRID
    1390282681221857664
  • NII Article ID
    210000038533
    110003922611
    130004520773
  • NII Book ID
    AA10650595
  • DOI
    10.1143/jjap.34.l1517
  • COI
    1:CAS:528:DyaK2MXpsFKktLg%3D
  • ISSN
    13474065
    00214922
  • Text Lang
    en
  • Data Source
    • JaLC
    • Crossref
    • CiNii Articles
  • Abstract License Flag
    Disallowed

Report a problem

Back to top