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Direct Evidence that Dislocations are Non-Radiative Recombination Centers in GaN.
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- Sugahara Tomoya
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Sato Hisao
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Hao Maosheng
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Naoi Yoshiki
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Kurai Satoshi
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Tottori Satoru
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Yamashita Kenji
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Nishino Katsushi
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Romano Linda T.
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
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- Sakai Shiro
- Department of Electrical and Electronic Engineering, University of Tokushima, 2–1 Minami–Josanjima, Tokushima 770, Japan
Bibliographic Information
- Other Title
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- Direct Evidence that Dislocations are N
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Description
Plan-view transmission electron microscopy (TEM) and cathodoluminescence (CL) images were taken for the same sample at exactly the same location in n-type GaN grown on sapphire substrate by metalorganic chemical vapor deposition (MOCVD). There was a clear one to one correspondence between the dark spots observed in CL images and the dislocations in TEM foils, indicating that the dislocations are non-radiative recombination centers. The hole diffusion length in n-type GaN was estimated to be neighboring 50 nm by comparing the diameters of the dark spots in thick samples used for CL and samples that were thinned for TEM observation. The efficiency of light emission is high as long as the minority carrier diffusion length is shorter than the dislocation spacing.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 37 (4A), L398-L400, 1998
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681224759424
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- NII Article ID
- 210000044484
- 110003927477
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- NII Book ID
- AA10650595
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- COI
- 1:CAS:528:DyaK1cXis1Cmtr4%3D
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/00214922
- http://id.crossref.org/issn/13474065
- https://id.crossref.org/issn/13474065
- https://id.crossref.org/issn/00214922
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- NDL BIB ID
- 4462464
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed