Patterned Alignment of Liquid Crystal on Photopolymer by Single-Exposure Photocuring Process.
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- Rajesh Kumar
- Department of Electrical and Electronic Engineering, Akita University, 1–1 Tegata gakuenmachi, Akita 010–8502, Japan
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- Yamaguchi Rumiko
- Department of Electrical and Electronic Engineering, Akita University, 1–1 Tegata gakuenmachi, Akita 010–8502, Japan
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- Sato Akira
- Department of Electrical and Electronic Engineering, Akita University, 1–1 Tegata gakuenmachi, Akita 010–8502, Japan
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- Sato Susumu
- Department of Electrical and Electronic Engineering, Akita University, 1–1 Tegata gakuenmachi, Akita 010–8502, Japan
書誌事項
- タイトル別名
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- Patterned Alignment of Liquid Crystal o
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We have promoted the complex patterned orientation of liquid crystal on polyvinyl cinnamate (PVCi) substrates by a single-exposure technique using the photocuring process. The process involves the polymerization of the polymer simultaneously by optical and thermal means. The information restored in the form of homogeneous or homeotropic orientation of the liquid crystal is nonerasable and permanent.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 37 (11), 6111-6112, 1998
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681225104768
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- NII論文ID
- 110003906872
- 130004524284
- 210000043909
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4621647
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可