Synthesis of Ti-Al Intermetallic Compound Films by Intense Pulsed Ion Beam Evaporation.
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- Suzuki Tsuneo
- Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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- Kishima Masayuki
- Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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- Jiang Weihua
- Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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- Yatsui Kiyoshi
- Extreme Energy-Density Research Institute, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan
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抄録
In order to examine the possibility of the synthesis of an intermetallic compound thin film by intense, pulsed, ion beam evaporation (IBE), the synthesis of thin films of Ti-Al system intermetallic compound was attempted. The crystal structure and composition of the films were evaluated. By using a combination target of Ti and Al, thin films of single phase could not be synthesized, while the Ti3Al film was found to be successfully synthesized by using a Ti/Al sintered target. The Ti3Al film was orientated in the 002 plane.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 40 (2B), 1042-1044, 2001
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681228067968
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- NII論文ID
- 210000048951
- 10006615777
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 5705724
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可