On the Carrier Concentration and Hall Mobility in GaN Epilayers.
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- Ko Chih-Hsin
- Institute of Microelectronics & Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, R.O.C.
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- Chang Shoou-Jinn
- Institute of Microelectronics & Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, R.O.C.
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- Su Yan-Kuin
- Institute of Microelectronics & Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, R.O.C.
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- Lan Wen-How
- Materials R&D Center, Chung-Shan Institute of Science & Technology, Tao-Yuan, Taiwan, R.O.C.
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- Chen Jone F.
- Institute of Microelectronics & Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, R.O.C.
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- Kuan Ta-Ming
- Institute of Microelectronics & Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, R.O.C.
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- Huang Yao-Cong
- Institute of Microelectronics & Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, R.O.C.
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- Chiang Chung-I.
- Materials R&D Center, Chung-Shan Institute of Science & Technology, Tao-Yuan, Taiwan, R.O.C.
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- Webb Jim
- Institute for Microstructural Sciences, National Research Council, Montreal Rd., Ottawa, Canada K1A 0R6
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- Lin Wen-Jen
- Materials R&D Center, Chung-Shan Institute of Science & Technology, Tao-Yuan, Taiwan, R.O.C.
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説明
The dependence of Hall mobility and carrier concentration in GaN epilayers on light illumination was examined. It was found that Hall mobility and electron concentration both increased after illumination with red laser (632.8 nm) and green laser (530 nm). However, no changes in Hall mobility and carrier concentration were found, if IR-laser (850 nm) was used. The results reveal that deep-level defects were excited and hence extra carriers were generated by light illumination. The influence is more pronounced for thinner films. These observations indicate that donor-like defect-related states were located 1.48 to 2.33 eV below the conduction band edge.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 41 (3A), L226-L228, 2002
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681232369408
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- NII論文ID
- 110006350507
- 130004529311
- 210000052704
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 6079535
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- 本文言語コード
- en
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- JaLC
- NDLサーチ
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