An Introduction to Chemical Vapor Deposition
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- Kobayashi Minoru
- Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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- Hoshinouchi Susumu
- Manufacturing Development Laboratory, Mitsubishi Electric Corp.
Bibliographic Information
- Other Title
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- CVD薄膜形成技術
- CVD ハクマク ケイセイ ギジュツ
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Abstract
An outline of CVD (Chemical Vapor Deposition) technology is described. The CVD technology is widely used in semiconductor manufacturing process. The classification, features and applications of CVD are summarized.
Journal
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- CORROSION ENGINEERING
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CORROSION ENGINEERING 39 (10), 576-581, 1990
Japan Society of Corrosion Engineering
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Keywords
Details 詳細情報について
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- CRID
- 1390282681235554176
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- NII Article ID
- 130006025364
- 130004732140
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- NII Book ID
- AN00225595
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- ISSN
- 18841155
- 00109355
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- NDL BIB ID
- 3692518
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed