Atomic Force Microscope Cantilever Array for Parallel Lithography of Quantum Devices
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- Kakushima Kuniyuki
- Institue of Industrial Science, the University of Tokyo
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- Watanabe Toshiyuki
- Ritsumeikan University
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- Shimamoto Kouji
- Ritsumeikan University
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- Gouda Takushi
- Kagawa University
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- Ataka Manabu
- Institue of Industrial Science, the University of Tokyo
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- Mimura Hidenori
- Shizuoka University
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- Isono Yoshimasa
- Ritsumeikan University
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- Hashiguchi Gen
- Kagawa University
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- Mihara Yutaka
- Kagawa University
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- Fujita Hiroyuki
- Institue of Industrial Science, the University of Tokyo
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Description
Arrayed atomic force microscope (AFM) cantilevers for parallel scanning probe lithography (SPL) have been fabricated by silicon micromachining. Fabrication is based on three KOH etching steps and local oxidation processes. The curvature radius of the tips is as sharp as 20 nm. A laser beam focused onto the middle probe enables us to observe the wafer for alignment and confirm the patterns after the SPL operation. Parallel SPL on N-octadecyltrimethoxysilane (ODS) self-assembled monolayer (SAM) films is susessfully demonstrated with five probes. Good alignment and homogeneity are obtained with simple operation. Parallel SPL for parallel quantum device fabrications is also reported.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 43 (6B), 4041-4044, 2004
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681240521344
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- NII Article ID
- 10013276597
- 130004532263
- 210000055840
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- NII Book ID
- AA10457675
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/00214922
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- NDL BIB ID
- 6996898
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed
