Progress in the Efficiency of Wide-Gap Cu(In<sub>1-x</sub>Ga<sub>x</sub>)Se<sub>2</sub> Solar Cells Using CIGSe Layers Grown in Water Vapor
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- Ishizuka Shogo
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Sakurai Keiichiro
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Yamada Akimasa
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Shibata Hajime
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Matsubara Koji
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Yonemura Minoru
- Tokyo University of Science
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- Nakamura Satoshi
- Tokyo University of Science
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- Nakanishi Hisayuki
- Tokyo University of Science
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- Kojima Takeshi
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Niki Shigeru
- National Institute of Advanced Industrial Science and Technology (AIST)
書誌事項
- タイトル別名
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- Progress in the Efficiency of Wide-Gap Cu(In1-xGax)Se2 Solar Cells Using CIGSe Layers Grown in Water Vapor
- Progress in the efficiency of wide-gap Cu(In1−xGax)Se2 solar cells using CIGSe layers grown in water vapor
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抄録
Progress in the performance of wide-gap Cu(In1−xGax)Se2 (CIGSe) solar cells for x values around 0.5 has been demonstrated using CIGSe layers grown in the presence of water vapor. While CIGSe thin films deposited in the presence of water vapor showed variations in electrical properties such as increases in hole carrier density and a consequent enhancement of p-type conductivity, no significant changes in the morphology and growth orientation were observed. Both the open circuit voltages and current densities of the CIGSe solar cells were improved using CIGSe layers grown in water vapor. An 18.1%-efficient cell with an open circuit voltage of 0.744 V, a current density of 32.4 mA/cm2 and a fill factor of 0.752 was fabricated from a 1.3 eV-CIGSe (x∼0.48) layer.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (20-23), L679-L682, 2005
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681240778880
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- NII論文ID
- 210000059622
- 10016150828
- 130004533363
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- NII書誌ID
- AA11906093
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 7339273
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可