Low Temperature Synthesis of Extremely Dense and Vertically Aligned Single-Walled Carbon Nanotubes
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- Zhong Guofang
- School of Science and Engineering, Waseda University
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- Iwasaki Takayuki
- School of Science and Engineering, Waseda University
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- Honda Kotaro
- School of Science and Engineering, Waseda University
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- Furukawa Yukio
- School of Science and Engineering, Waseda University
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- Ohdomari Iwao
- School of Science and Engineering, Waseda University
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- Kawarada Hiroshi
- School of Science and Engineering, Waseda University
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説明
A novel point-arc microwave plasma chemical vapor deposition (CVD) apparatus was employed to grow single-walled carbon nanotubes (SWNTs) on Si substrates coated with a sandwich-like nano-layer structure of 0.7 nm Al2O3 (top)/0.5 nm Fe/5–70 nm Al2O3 by conventional high frequency sputtering. The growth of extremely dense and vertically aligned SWNTs with an almost constant growth rate of 270 μm/h within 40 min at a temperature as low as 600°C was demonstrated for the first time. The volume density of the as-grown SWNT films is as higher as 66 kg/m3.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (4A), 1558-1561, 2005
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681240969984
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- NII論文ID
- 10015469526
- 130004533642
- 210000057532
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
- http://id.crossref.org/issn/00214922
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- NDL書誌ID
- 7302044
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
