Photoexicitation Process Leading to Modification on Poly(tetrafluoroethylene) Surface by Irradiation of Synchrotron Radiation in Soft X-ray Region(Brief Communication)

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  • Kanda Kazuhiro
    University of Hyogo, Laboratory of Advanced Science and Technology for Industry
  • Kato Yuri
    University of Hyogo, Laboratory of Advanced Science and Technology for Industry
  • Ideta Tomoya
    University of Hyogo, Faculty of Engineering
  • Haruyama Yuichi
    University of Hyogo, Laboratory of Advanced Science and Technology for Industry
  • Ishigaki Hiroyuki
    University of Hyogo, Faculty of Engineering
  • Matsui Shinji
    University of Hyogo, Laboratory of Advanced Science and Technology for Industry

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  • Photoexcitation Process Leading to Modification on Poly(tetrafluoroethylene) Surface by Irradiation of Synchrotron Radiation in Soft X-ray Region

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説明

Photoexcitation process leading to a variation in the wettability of a poly(tetrafluoroethylene) (PTFE) surface induced by synchrotron radiation (SR) exposure in the soft X-ray region was investigated. It was found that two types of photoexcitation, that is, the formations of a hydrophobic surface and a hydrophilic surface, proceed on the PTFE surface with the exposure to SR. The formation rate of the hydrophobic surface strongly depended on substrate temperature.

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