Pulsed Laser Deposition of Ferroelectric (Na0.5K0.5)NbO3-Based Thin Films

DOI Web Site Web Site Web Site 13 Citations 16 References

Bibliographic Information

Other Title
  • Pulsed Laser Deposition of Ferroelectric (Na<sub>0.5</sub>K<sub>0.5</sub>)NbO<sub>3</sub>-Based Thin Films

Search this article

Description

Ferroelectric (Na0.52K0.44Li0.04)(Nb0.84Ta0.10Sb0.06)O3 thin films were epitaxially grown on a (100)SrRuO3||(100)SrTiO3 substrate by pulsed laser deposition. Crystallographic analysis of the film was performed using conventional X-ray diffraction analysis and rocking curve measurements. High resolution X-ray diffraction reciprocal space map was also measured to analyze the crystallographic relationship between the grown film and the SrTiO3 substrate and to determine the strain state of the film. The full width at half maximum of the rocking curve was as small as 0.19° and the determined pseudo-tetragonal lattice parameters were a=3.947 Å and c=3.955 Å. The P–E hysteresis loop of the film was characteristic of ferroelectric behavior.

Journal

Citations (13)*help

See more

References(16)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top