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Perovskite Single-Phase Growth of Epitaxial Pb(Zn1/3Nb2/3)O3 Films by Alternative-Source-Gas-Introduced Metalorganic Chemical Vapor Deposition
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- Yokoyama Shintaro
- Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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- Okamoto Satoshi
- Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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- Saito Keisuke
- Bruker AXS K.K.
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- Uchida Hiroshi
- Department of Chemistry, Faculty of Science and Technology, Sophia University
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- Koda Seiichiro
- Department of Chemistry, Faculty of Science and Technology, Sophia University
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- Funakubo Hiroshi
- Department of Innovative and Engineered Materials, Tokyo Institute of Technology
Bibliographic Information
- Other Title
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- Perovskite Single-Phase Growth of Epitaxial Pb(Zn<sub>1/3</sub>Nb<sub>2/3</sub>)O<sub>3</sub> Films by Alternative-Source-Gas-Introduced Metalorganic Chemical Vapor Deposition
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Description
Relaxor-type ferroelectric Pb(Zn1⁄3Nb2⁄3)O3 [PZN] films were prepared on (100), (110), (111)SrTiO3 and MgO substrates by metalorganic chemical vapor deposition (MOCVD). The dependences of the constituent phase of the deposited films on the sequence of gas introduction in the MOCVD and on the kinds of substrates and the orientation of the substrates were investigated systematically. Compared with continuous and pulsed sequences of source gas introduction, an alternative sequence of source gas introduction of the Pb and Zn+Nb, named alternative MOCVD, produces a higher phase purity of perovskite for film deposited on (100)MgO substrates. In addition, the phase-pure perovskite PZN film was first grown on (110) and (111)MgO substrates. This is due to the relatively smaller lattice mismatch between the perovskite PZN and the substrate than that between an impurity phase, pyrochlore, and substrates that exists when films are deposited on these substrates. This is the first reported deposition of the pyrochlore-free phase-pure epitaxial PZN films.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (46-49), L1452-L1455, 2005
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681245672960
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- NII Article ID
- 210000059402
- 10016873391
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- NII Book ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 7739587
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- Text Lang
- en
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- Article Type
- journal article
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
- KAKEN
- OpenAIRE
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- Abstract License Flag
- Disallowed
