Characteristics of Fluorocarbon Radicals and CHF3 Molecule in CHF3 Electron Cyclotron Resonance Downstream Plasma

DOI Web Site Web Site 9 Citations 27 References
  • Takahashi Kunimasa
    Department of Quantum Engineering, School of Engineering, Nagoya University, Furo–cho, Chikusa–ku, Nagoya 464–01
  • Hori Masaru
    Department of Quantum Engineering, School of Engineering, Nagoya University, Furo–cho, Chikusa–ku, Nagoya 464–01
  • Goto Toshio
    Department of Quantum Engineering, School of Engineering, Nagoya University, Furo–cho, Chikusa–ku, Nagoya 464–01

Bibliographic Information

Other Title
  • Characteristics of Fluorocarbon Radicals and CHF<sub>3</sub>Molecule in CHF<sub>3</sub>Electron Cyclotron Resonance Downstream Plasma
Published
1994
DOI
  • 10.1143/jjap.33.4745
Publisher
The Japan Society of Applied Physics

Search this article

Description

The CF, CF2 and CF3 radical densities and CHF3 molecule density were measured in a CHF3 electron cyclotron resonance (ECR) downstream plasma using infrared diode laser absorption spectroscopy (IRLAS). The intensities of emission lines F*, Ar* and Hα were also measured in a CHF3/3 % Ar ECR downstream plasma using optical emission spectroscopy (OES). These measurements were carried out as a function of the microwave power and the pressure with modulation of the power with an on-period of 15 ms and an off-period of 85 ms. On the basis of the results of IRLAS and OES measurements, the behaviors of the radicals in the ECR plasma have been investigated in detail.

Journal

Citations (9)*help

See more

References(27)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top