Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) 2. Environmentally Benign Process in Ethyl Lactate
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- Fukukawa Ken-ichi
- Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
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- Shibasaki Yuji
- Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
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- Ueda Mitsuru
- Department of Organic & Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
書誌事項
- タイトル別名
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- Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azomethine) II. Environmentally Benign Process in Ethyl Lactate
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説明
The synthesis and photosensitivity of poly(o-hydroxyazomethine) (PHAM) from isophthalaldehyde (IPA) and 4,4′-(hexafluoroisopropylidene)bis(o-aminophenol) (6FAP) in an environmentally friendly solvent, ethyl lactate (EL) was investigated. Polycondensation of IPA and 6FAP proceeded in EL, giving PHAM with a number average molecular weight more than ten thousands. The solution of PHAM in EL showed a good stability for hydrolysis. The photosensitive film cast from the solution of PHAM and 25 wt % 1-{1,1-bis[4-(2-diazo-1-(2H)-naphthalenone-5-sulfonyloxy)phenyl]methylethyl}benzene (S-DNQ) in EL showed a sensitivity (D0) of 250 mJ/cm2 and a contrast (γ0) of 2.5 with 436 nm light (g-line), respectively. A fine positive image featuring 10 μm line-and-space pattern was observed on the film of the photoresist exposed to 200 mJ/cm2 of g-line by the contact-printing mode. The positive image was successfully converted to a poly(benzoxazole) (PBO) pattern by thermal treatment. The optically estimated dielectric constant of the PBO is 2.76.
収録刊行物
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- Polymer Journal
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Polymer Journal 36 (6), 489-494, 2004
The Society of Polymer Science, Japan
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詳細情報 詳細情報について
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- CRID
- 1390282681264911744
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- NII論文ID
- 10013081249
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- NII書誌ID
- AA00777013
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- ISSN
- 13490540
- 00323896
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- NDL書誌ID
- 6968203
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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