Microstructure of Co Ferrite Films and Co Ferrite/Zn Ferrite Double Layered Films Prepared by Plasma Enhanced MOCVD.

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  • Fujii Eiji
    Materials and Components Research Laboratory, Matsushita Electric Industrial Co. Ltd.
  • Torii Hideo
    Materials and Components Research Laboratory, Matsushita Electric Industrial Co. Ltd.
  • Hattori Masumi
    Materials and Components Research Laboratory, Matsushita Electric Industrial Co. Ltd.
  • Fujii Tatsuo
    Department of Applied Chemistry, Faculty of Engineering, Okayama University
  • Kuribayashi Kiyoshi
    Department of materials, The Nishi-Tokyo University
  • Inoue Miyoshi
    Department of materials, The Nishi-Tokyo University

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Other Title
  • プラズマＭＯＣＶＤ法によるＣｏフェライト膜およびＣｏフェライト／Ｚｎフェライト二層膜の微細構造
  • プラズマ MOCVDホウ ニ ヨル Co フェライト マク オヨビ Co フェ

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Abstract

Cox Fea-xO4 (0. 1≤×≤1.0) films and a Co0.1Fe2.9 O4/Zn0.5Fe2.5O4 double layered film were prepared on soda-lime glass substrate (a=87×10-7/deg) by plasma enhanced MOCVD and their microstructures and magnetic properties were studied. The Co ferrite films consisted of a random orientated initial layer (thickness < 100 nm) and an <100> orientated columnar layer. Conversion electron Mossbauer spectra and magnetization curves of the films indicated that the films had an easy axis perpendicular to the film plane. The Co ferrite film with higly perpendicular magnetic anisotropy could be obtained by using Zn ferrite film (thickness:210 nm) as a buffer layer between the Co ferrite film and the substrate.

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