Optical and Structural Characterization of TiO2/SiO2 Multilayer Films Prepared by Helicon Plasma Sputtering.
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- Wang Xinrong
- Institute for Materials Research, Tohoku University
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- Masumoto Hiroshi
- Institute for Materials Research, Tohoku University
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- Someno Yoshihiro
- Mechatronic Devices Division1, ALPS Electric Co. Ltd.
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- Hirai Toshio
- Institute for Materials Research, Tohoku University
Bibliographic Information
- Other Title
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- 光機能材料 ヘリコンスパッタ法により作製したTiO2/SiO2多層膜の微細構造および光学特性
- ヘリコンスパッタホウ ニ ヨリ サクセイ シタ TiO2 SiO2 タソウ マク ノ ビサイ コウゾウ オヨビ コウガク トクセイ
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Abstract
Alternating TiO2/SiO2 multilayer optical films were fabricated on BK7 glass and Si (100) substrates by helicon plasma sputtering at room temperature. Optical and structural characterization of monolayers of TiO2 and SiO2 films, and their multilayers have been performed. The results of structural analysis show that the TiO2 and SiO2 films have a homogeneous and amorphous microstructure. Auger electron spectroscopy (AES) and transmission electron microscopy (TEM) observations reveal that TiO2/SiO2 multilayer films have well-defined interface. Five layers of alternating TiO2 and SiO2 exhibit maximum reflectance of 87% around the central wavelength of 800 nm which agrees well with the theoretical result.
Journal
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- Journal of the Japan Society of Powder and Powder Metallurgy
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Journal of the Japan Society of Powder and Powder Metallurgy 46 (2), 180-184, 1999
Japan Society of Powder and Powder Metallurgy
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Details 詳細情報について
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- CRID
- 1390282681285408000
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- NII Article ID
- 10002261881
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- NII Book ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL BIB ID
- 4655572
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed