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- Noda Shoji
- (株)豊田中央研究所研究5部
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- Doi Haruo
- (株)豊田中央研究所研究5部
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- Kamigaito Osami
- (株)豊田中央研究所研究5部
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- Suzuki Noritomo
- (株)豊田中央研究所研究4部
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- Ishiguro Tomomi
- (株)豊田中央研究所研究4部
Bibliographic Information
- Other Title
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- N<SUP>+</SUP>イオン注入したZr/サファイヤの界面状態
- N + イオン チュウニュウシタ Zr サファイア ノ カイメン ジョウタイ
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Abstract
The interface of the Zr/sapphire implanted with N+ ions were examined by RBS and cross-sectional TEM observations. The ion implantation induced the interdiffusion of atoms at the interface and the clear border-line between the Zr film and sapphire was found to disappear. The thickness of the diffusion layer was estimated to be about 10 nm at the interface of the Zr/sapphire implanted with N+ ions to the dose of 2×1017/cm2.
Journal
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- Journal of the Japan Society of Powder and Powder Metallurgy
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Journal of the Japan Society of Powder and Powder Metallurgy 34 (9), 494-496, 1987
Japan Society of Powder and Powder Metallurgy
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Keywords
Details 詳細情報について
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- CRID
- 1390282681285440128
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- NII Article ID
- 130000813170
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- NII Book ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL BIB ID
- 3171288
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed