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- 野村 幹弘
- 芝浦工業大学 応用化学科
書誌事項
- タイトル別名
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- Hydrogen Permeation Property and Hydrothermal Stability of an Amorphous Silica Membrane
- アモルファス シリカ マク ノ スイソ トウカセイ オヨビ スイジョウキ タイキュウセイ
この論文をさがす
抄録
Hydrogen permeselective silica membranes prepared by using a counter diffusion CVD method had been investigated in the effects of deposition temperatures and those of γ-alumina substrates. Hydrothermal stable silica membranes were obtained between 550 and 600 ℃ of deposition temperatures for the TMOS (tetramethyl orthosilicate)/ O2 system. Silica layer deposited at the lower temperature was damaged due to compaction of the deposited silica, while γ-alumina layer (support of the silica layer) must be damaged for the higher deposition temperature. Addition of Ga to γ-alumina is one idea to improve the stability of the support. As a result, decrease of hydrogen permeance through the silica membrane by hydrothermal treatment was reduced. It is important to improve support stability to improve the permeation properties of the silica layer deposited on the support.
収録刊行物
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- 膜
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膜 32 (6), 340-346, 2007
日本膜学会
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詳細情報 詳細情報について
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- CRID
- 1390282681398396928
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- NII論文ID
- 10019981141
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- NII書誌ID
- AN0023215X
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- ISSN
- 18846440
- 03851036
- http://id.crossref.org/issn/03851036
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- NDL書誌ID
- 9293954
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可