電子分光法による絶縁物の表面分析と帯電現象

DOI Web Site 被引用文献1件 参考文献13件
  • 一村 信吾
    産業技術総合研究所極微プロファイル計測研究ラボ

書誌事項

タイトル別名
  • Charging Phenomena during Surface Analysis by Electron Spectroscopy of Insulating Materials

抄録

Charging phenomena that occur during XPS and AES analysis of insulating materials are discussed, with special focus on surface potential change by X-ray or electron beam irradiation. Some typical examples of charging phenomena observed during XPS analysis are introduced together with practical methods for charge compensation and for the estimation of peak shifts by charging. As the practical methods are now under discussion in the frame of ISO activities, the content of relating ISO document (ISO 19318) is also briefly explained. Then charging phenomena observed in AES analysis of insulating materials are discussed in terms of the relation between surface charging and secondary electron emission, for which a new concept of static/dynamic secondary electron yield is explained. Practical methods for charge compensation in AES analysis are also introduced, and experimental results showing the effect of those methods are presented.

収録刊行物

  • 表面科学

    表面科学 24 (4), 207-214, 2003

    公益社団法人 日本表面科学会

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