Synthesis of High Quality Complex Oxide Thin Films by Pulsed Laser Deposition
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- OHNISHI Tsuyoshi
- National Institute for Materials Science
Bibliographic Information
- Other Title
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- パルスレーザー堆積法による高品質複酸化物薄膜の作製
- パルスレーザー タイセキホウ ニ ヨル コウヒンシツフクサンカブツ ハクマク ノ サクセイ
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Description
Reproducible way to grow high quality complex oxide thin films by means of pulsed laser deposition is addressed. Laser ablation conditions are the most essential ones to be controlled precisely because it directly relates to cation ratio of deposited thin films. In some specific case, substrate temperature and gas pressure also become important to control the film composition. Film quality is tightly correlated to the thin film stoichiometry.
Journal
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- Hyomen Kagaku
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Hyomen Kagaku 38 (5), 216-221, 2017
The Surface Science Society of Japan
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Details 詳細情報について
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- CRID
- 1390282681436099200
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- NII Article ID
- 130007332067
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- NII Book ID
- AN00334149
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- ISSN
- 18814743
- 03885321
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- NDL BIB ID
- 028223281
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed