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- 本間 敬之
- 早稲田大学理工学部
書誌事項
- タイトル別名
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- Nanofabrication and Device Formation Utilizing the Reactions at Solid/Liquid Interfaces
- コエキ カイメン ハンノウ オ モチイタ ナノファブリケーション ト デバイス コウチク
この論文をさがす
説明
Features of the nanofabrication and device formation processes utilizing the reactions at solid/liquid interfaces, such as electrodeposition and electroless deposition, were overviewed and some of the recent applications were introduced. The features of the processes were compared with those using the physical deposition processes, and then the fabrication process using “through-mask” and “maskless” approaches were explained. As for the “through-mask” processes, the microscale electrodeposition process for the fabrication of the array of mushroom-shaped metallic absorber for the high sensitive X-ray imaging sensor, the so called X-ray microcalorimeter array, was explained. The electroless deposition process of CoNiP to form the array of magnetic nano dots was also introduced. On the other hand, the maskless and electroless fabrication process of the pattern of metallic nano dots on Si wafer surfaces was also explained, which utilized the local deposition activity induced at the nanoscopic defect sites on the wafer surface.
収録刊行物
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- 表面科学
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表面科学 25 (5), 265-271, 2004
公益社団法人 日本表面科学会
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詳細情報 詳細情報について
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- CRID
- 1390282681436402944
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- NII論文ID
- 10012929605
- 30038061850
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- NII書誌ID
- AN00334149
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- COI
- 1:CAS:528:DC%2BD2cXlsl2ltb8%3D
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- ISSN
- 18814743
- 03885321
- http://id.crossref.org/issn/03885321
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- NDL書誌ID
- 6946120
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- 本文言語コード
- ja
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- 資料種別
- journal article
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
- KAKEN
- OpenAIRE
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- 使用不可