Fabrication of SiC/Si3N4 Composite Particles by Ultrafine-Powder Coating Reactor Using Thermal CVD Technique

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  • Uemiya Shigeyuki
    Department of Materials Science and Technology, Faculty of Engineering, Gifu University Department of Materials and Life Science, Faculty of Science and Engineering, Seikei University
  • Hanabusa Takanobu
    Department of Materials and Life Science, Faculty of Science and Engineering, Seikei University
  • Kojima Toshinori
    Department of Materials and Life Science, Faculty of Science and Engineering, Seikei University

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Other Title
  • 熱ＣＶＤ法による超微粒子コーティング装置を用いたＳｉＣ／Ｓｉ３Ｎ４複合粉体の作製
  • ネツ CVDホウ ニ ヨル チョウビリュウシ コーティング ソウチ オ モチイタ SiC Si3N4 フクゴウ フンタイ ノ サクセイ

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Abstract

  Si3N4 fine particles covered with deposited SiC ultrafine powder, denoted as SiC/Si3N4 composites, with excellent sinterability were prepared by an ultrafine powder coating reactor using thermal CVD technique. Reactant gases used were monosilane and ethylene. The CVD reactor was designed to accelerate homogeneous nucleation reaction. The effects of reactant gas flow rate ratio, C/Si, and reaction temperature on C2H4 conversion, C content in the deposited ultrafine powder and C selectivity were investigated. The CVD conditions were optimized to form stoichiometric ultrafine powder. The XPS results of ultrafine powder predict the synthesis of stoichiometric SiC. The required conditions for the sintering of the produced SiC/Si3N4 composites were drastically milder than that for a conventional sintering process for commercial Si3N4 fine particles. The application of our CVD reactor will be expected to the preparation of various composite particles with easy sinterability.<br>

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