超磁歪材料薄膜の磁歪特性に及ぼすイオン衝撃の影響

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  • Effects of Ion Bombardment on Magnetostrictive Properties of Giant Magnetostrictive Thin Films

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  Sm27Fe73 films fabricated by a magnetron sputtering were studied with respect to magnetism and plasma physics. A new parameter ‘Pi’ was proposed to evaluate effects of ion bombardment for a magnetostriction. The Pi is represented as Pi=(i/a)•(2mi Ei)1/2, here i is ion flux, a is material flux, mi is the ion mass and Ei is the ion energy. The plasma parameter was determined by Langmuir probes. As a result, the inplane magnetic anisotropy was enhanced by increasing of the Pi. Increase of the Pi induced an increase of magnetostrictive susceptibility and a decrease of saturated magnetstriction. This is probably caused by a change of internal stress accompanied with the Pi.<br>

収録刊行物

  • 日本金属学会誌

    日本金属学会誌 72 (9), 714-718, 2008

    公益社団法人 日本金属学会

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