Determination of Silver and Arsenic in High-Purity Metallic Silicon by Radioactivation Method
Bibliographic Information
- Other Title
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- 放射活性化分析による高純度金属シリコン中の銀およびヒ素の定量
- ホウシャ カッセイカ ブンセキ ニ ヨル コウジュンド キンゾク シリコン チュウ ノ ギン オヨビ ヒソ ノ テイリョウ
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Abstract
Silver and arsenic in high-purity metallic silicon were determined by radioactivation method. The sample was irradiated in a pile by a neutron flux of 4×1011 n/cm2·sec intermittently for 3 days. Then silicon was expelled by treating with hydrofluoric acid. From the residue after the sublimation of silicon tetra fluoride, silver was separated as silver chloride and arsenic was collected on manganese dioxide. Carrying the analysis on two kinds of samples, 0.249 ppm silver and 0.0034 ppm arsenic, and 0.372 ppm silver and 0.0616 ppm arsenic were found.
Journal
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- Journal of the Japan Institute of Metals and Materials
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Journal of the Japan Institute of Metals and Materials 24 (2), 85-88, 1960
The Japan Institute of Metals and Materials
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Details 詳細情報について
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- CRID
- 1390282681458374912
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- NII Article ID
- 40018257637
- 130007333260
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- NII Book ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL BIB ID
- 9153077
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed